RF / DC Sputtering Systems and Vacuum Evaporation Systems

We offer a variety of RF & DC power supplies, vacuum pumps, vacuum valves, photolithography equipment, controllers, displays, and miscellaneous items such as Barrett centrifuge equipment, Kalamazoo electric saw, IAS laminar flow hoods, Blak-Ray longwave UV lamps, infra red heaters, granite and marble vibration isolation tables, lab tables, lab stools and chairs, file cabinets, chemical storage cabinets, eye & face wash fixture, etc...

Vacuum Evaporator

  • Manufacturer: CHA INDUSTRIES
  • Model: SE-400-RAP
  • Features:

  • Motorized Hoist
  • 6" diffusion pump
  • Welch 1376 Mechanical Pump
  • 18" dia., 30" high Bell jar with Guard (20" dia. stainless steel baseplate)
  • 18" dia. feedthru ring with flanges for feedthrus
  • 6 KW rated Heater Power Supply with SCR Power & Temp. Controllers (110 V-208 V, 3 phase, 60 Hz)
  • Molecular Sieve Trap with Timer Control
  • Electrical req. : 110-208/2/60, 5 wire, 80 amps
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    Vacuum Deposition chamber

  • Manufacturer: NRC
  • Model: Was part of an NRC 3317 Sputtering System
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    Vacuum Deposition chamber

  • Manufacturer: NRC
  • Small (12" OD) stainless steel chamber
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    Round Magnetron Sputtering Deposition Source

  • Manufacturer: Kurt J. Lesker
  • Model: Torus 101
  • Aluminum target
  • Complete with ground shields & feedthrus
  • 6 3/8 inch diameter
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    Magnetron Sputtering Deposition Source

  • Manufacturer: Kurt J. Lesker
  • Model: Torus 101
  • Complete with ground shields and feedthrus
  • Rectangular 4 5/8 " x 7 5/8 "
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    Round Sputtering targets for 5" S-guns

  • Manufacturer: Varian Specialty Metals
  • Model: for Varian 5" S-guns
  • Available Options:
  • 1. Aluminum (new)
  • 2. Copper (new)
  • 3. Chromium (new)
  • 4. Tantalum (new)
  • 5. Magnetic (1 Ni - 19 Fe) (new)
  • 6. Aluminum (slightly used)
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    Round Sputtering targets for 5" S-guns

  • Manufacturer: Demetron
  • Available Options:
  • 1. Carbon (new)
  • 2. Titanium (slightly used)
  • 3. Chromium (new)
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    Rectangular sputtering targets (never used)

  • Manufacturer: Mitsubishi Metal Corporation
  • Size 5" x 8" x 0.125" Available Options:
  • 80 Co - 20 Ni (2)
  • 87 Co - 13 Cr (2)
  • 81 Ni - 19 Fe (2)
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    Used MRC Systems Sputtering targets

  • Manufacturer: MRC Systems
  • 8" dia. ; 0.25" thick with bonded copper backing plate
  • Available Options:
  • 98 ZnO - 2 Al2O3
  • 2 Nickel - Vanadium (pictured)
  • Zinc sulfide
  • Nickel
  • Tin oxide
  • SiO2
  • Molybdenum
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    CdS doped cadmium selenide target

  • Manufacturer: Plasmaterials
  • 8" dia., 0.25" thickness
  • Bonded to copper water-cooled backing plate
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    Round Sputtering targets for 5" S-guns

  • Manufacturer: ENERJET
  • Model: for ENERJET 5" S-guns
  • Available Options:

  • Zinc-Aluminum oxide target (new)
  • ZnO 98% - Al2 O3 2%

    (99.9% purity Torus 10)

  • Indium - Tin oxide target (new)
  • In2O3 90% - SnO2 10%

    (99.97% purity Torus 10)

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    Ion Beam Etching & Semiconductor Equipment

    Plasma Etch System

  • Manufacturer: PlasmaTherm
  • Model: PK-24
  • Features

    1. Chamber/Fixture
  • 26" dia x 5" high Al ring
  • 26" dia. Al substrate, 22" dia. RF top electrode
  • Both electrodes designed for temperature control, spacing adjustable (1/8" to 2")
  • 2. RF power 13.56 mhz, 3 Kw, auto tuning

    3. Pressure monitor and control
  • Capacitance manometer
  • Digital readout
  • Throttle valve and controller
  • 4. Pumping system
  • 40 DFM corrosion resistant pump, oil filtration system
  • 5. Gas inputs
  • 3 process gases - mass flow control
  • 2 purge gases - rotometer
  • Flowmeter ranges 0 - 10 SCCM; 0 - 100 SCCM; 0 - 1000 SCCM
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    Ion Beam Etching Systems

  • Manufacturer: TECHNICS
  • Model: MIM TLA-20
  • Operational when deinstalled.
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    Plasma Cleaning System

  • Manufacturer: Tegal
  • Model: Plasmaline
  • Operational when deinstalled.
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